文献类型：期刊文献

中文题名：Study on Magnetic Domain Structure of Co/Pt Dots Array

英文题名：Study on Magnetic Domain Structure of Co/Pt Dots Array

作者：Zhu Xifu[1,2];Jing Xiaojun[2];Du Huan[3]

第一作者：Zhu Xifu;朱喜福

通讯作者：Zhu, XF[1];Zhu, XF[2]

机构：[1]Beijing Union Univ, Teachers Colleage, Beijing 100101, Peoples R China;[2]Beijing Univ Posts & Telecommun, Sch Informat & Commun Engn, Beijing 100876, Peoples R China;[3]Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China

第一机构：北京联合大学师范学院

通讯机构：[1]corresponding author), Beijing Union Univ, Teachers Colleage, Beijing 100101, Peoples R China;[2]corresponding author), Beijing Univ Posts & Telecommun, Sch Informat & Commun Engn, Beijing 100876, Peoples R China.|[1141711]北京联合大学师范学院;[11417]北京联合大学;

年份：2017

卷号：26

期号：3

起止页码：654-657

中文期刊名：电子学报：英文版

外文期刊名：CHINESE JOURNAL OF ELECTRONICS

收录：CSTPCD;;EI(收录号：20203209031404);Scopus(收录号：2-s2.0-85019036970);WOS:【SCI-EXPANDED(收录号:WOS:000401309800029)】；CSCD:【CSCD2017_2018】；

基金：This work is supported by the National Program on Key Basic Research Project (973 Program) (No.001CB610601).

语种：英文

中文关键词：Magnetic domain structures;Co/Pt dots arrays;AFM and MFM images;Single domain state;Multi-domain state

外文关键词：Magnetic domain structures; Co/Pt dots arrays; AFM and MFM images; Single domain state; Multi-domain state

摘要：Co/Pt multilayer dots arrays with 580-nm periodicity were fabricated using Laser interference lithography(LIL)and an ion-beam milling technique.We obtained uniform dots arrays with a large area by optimizing the exposure parameters and improving exposure conditions.We obtained their shapes and magnetic domain structures and investigated using an Atomic force microscope(AFM)and Magnetic force microscope(MFM).The AFM and MFM images show:1)when their size is smaller than 400nm,the dots are in single-domain state and their shape tends to be circular;and 2)when their size is greater than 400nm,the dots are in multi-domain state and they tend to form squares.The dots arrays possibly can be used in nano-scale magnetic storage.
Co/Pt multilayer dots arrays with 580-nm periodicity were fabricated using Laser interference lithography (LIL) and an ion-beam milling technique. We obtained uniform dots arrays with a large area by optimizing the exposure parameters and improving exposure conditions. We obtained their shapes and magnetic domain structures and investigated using an Atomic force microscope (AFM) and Magnetic force microscope (MFM). The AFM and MFM images show: 1) when their size is smaller than 400nm, the dots are in single-domain state and their shape tends to be circular; and 2) when their size is greater than 400nm, the dots are in multi-domain state and they tend to form squares. The dots arrays possibly can be used in nano-scale magnetic storage.