文献类型：期刊文献

中文题名：氮化硅反应炉内弥散相介质温度分布研究

英文题名：Study on the temperature distributing of dispersed medium in silicon nitride reaction furnace

作者：陈锦[1];李勋锋[2];尹少武[2];王立[2]

第一作者：陈锦

机构：[1]北京联合大学信息学院;[2]北京科技大学机械工程学院

第一机构：北京联合大学智慧城市学院

年份：2008

卷号：27

期号：3

起止页码：16-19

中文期刊名：冶金能源

外文期刊名：Energy for Metallurgical Industry

收录：CSTPCD;;北大核心:【北大核心2004】；

基金：留学启动基金项目(No.11140025)

语种：中文

中文关键词：氮化硅;温度场;产物质量浓度;弥散相介质

外文关键词：silicon nitride temperature field mass - density of product dispersed medium

摘要：基于商用CFD计算软件模拟了氮化硅反应炉内的温度场。分析了壁面热流对温度场和产物质量浓度的影响,研究了光学厚度和散射模型对温度场的影响。计算结果表明,壁面热流决定着产物的质量浓度;光学厚度越大,辐射所起的作用越明显;散射模型不同时,对径向温度分布影响较明显,而对轴向温度分布而言,相差很小。
Based on the software of CFD, the temperature field was simulated for Si3 N4 - reaction furnace in this paper. The influence of the heat flow on the temperature field and mass - density of the product have been studied. The influence of the optical thickness and the model of scattering on the temperature field have been calculated. The results showed that the heat flow played a crucial role for the mass - density of product; the more big the optical thickness, the more visible the action of radia- tion on the temperature field; the model of scattering had some influence on the radial temperature, however, little influence on the axial temperature.