文献类型：期刊文献

中文题名：掺氮TiO_2光学薄膜的吸光特性研究

英文题名：The absorption properties of nitrogen doped titanium dioxide thin films

作者：周友苏[1];马永新[1];范兵[2];张秀廷[2];薛文[2]

第一作者：周友苏

机构：[1]北京联合大学机电学院;[2]北京天瑞星真空技术开发有限公司

第一机构：北京联合大学机器人学院

年份：2008

期号：2

起止页码：196-197

中文期刊名：航天器环境工程

外文期刊名：Spacecraft Environment Engineering

收录：CSTPCD

语种：中文

中文关键词：薄膜;吸光特性;多弧离子镀

外文关键词：thin films;absorption properties;multi-arc ion plating

摘要：TiO2在光催化方面具有较好的应用前景,可望用于有害污染物的降解处理;但由于其禁带宽度对应的激发波长在紫外区,限制了其大规模应用。文章利用操作简便、易于控制的真空阴极电弧离子镀膜技术,制备了非掺氮和掺氮的TiO2薄膜。并分别在300℃和500℃退火后,获得了非晶态向锐钛矿结晶的转变。结果还表明,掺氮TiO2薄膜的相变温度比非掺氮的TiO2薄膜要高,其光吸收区也从紫外区扩展到了可见光区。
The photocatalytic oxidation technology of TiO2 has been widely studied as a potential method in treating organic pollutants in recent years. However,titanium dioxide shows photocatalytic activity only by irradiation of UV light due to its high intrinsic band gap,which restricts its use in the photocatalytic oxidation technique in practice. In this paper,titanium dioxide thin film and nitrogen doped TiO2 thin films,annealed at 300℃ and 500℃ for 0.5 h were prepared by multi-arc ion plating on glass substrates. The results show that the crystalline structure of nitrogen doped titanium dioxide thin films are noncrystal with their phase transform to anatase phase after being annealed at 500℃. The absorption edge of N-doped thin films prepared under optimal technological conditions has an obvious red-shift.